{"data":{"id":"10.48550/arxiv.cond-mat/9809006","type":"dois","attributes":{"doi":"10.48550/arxiv.cond-mat/9809006","prefix":"10.48550","suffix":"arxiv.cond-mat/9809006","identifiers":[{"identifier":"cond-mat/9809006","identifierType":"arXiv"}],"alternateIdentifiers":[{"alternateIdentifierType":"arXiv","alternateIdentifier":"cond-mat/9809006"}],"creators":[{"name":"Zywietz, T.","nameType":"Personal","givenName":"T.","familyName":"Zywietz","affiliation":[],"nameIdentifiers":[]},{"name":"Neugebauer, J.","nameType":"Personal","givenName":"J.","familyName":"Neugebauer","affiliation":[],"nameIdentifiers":[]},{"name":"Scheffler, M.","nameType":"Personal","givenName":"M.","familyName":"Scheffler","affiliation":[],"nameIdentifiers":[]}],"titles":[{"title":"Adatom Diffusion at GaN (0001) and (000bar1) Surfaces"}],"publisher":"arXiv","container":{},"publicationYear":1998,"subjects":[{"lang":"en","subject":"Condensed Matter (cond-mat)","subjectScheme":"arXiv"},{"subject":"FOS: Physical sciences","subjectScheme":"Fields of Science and Technology (FOS)"},{"subject":"FOS: Physical sciences","schemeUri":"http://www.oecd.org/science/inno/38235147.pdf","subjectScheme":"Fields of Science and Technology (FOS)"}],"contributors":[],"dates":[{"date":"1998-09-01T13:08:28Z","dateType":"Submitted","dateInformation":"v1"},{"date":"2009-11-30T20:54:44Z","dateType":"Updated","dateInformation":"v1"},{"date":"1998-09","dateType":"Available","dateInformation":"v1"},{"date":"1998","dateType":"Issued"}],"language":null,"types":{"ris":"RPRT","bibtex":"article","citeproc":"article-journal","schemaOrg":"ScholarlyArticle","resourceType":"Article","resourceTypeGeneral":"Text"},"relatedIdentifiers":[{"relationType":"IsVersionOf","relatedIdentifier":"10.1063/1.121909","relatedIdentifierType":"DOI"}],"relatedItems":[],"sizes":[],"formats":[],"version":"1","rightsList":[{"rights":"Assumed arXiv.org perpetual, non-exclusive license to distribute this article for submissions made before January 2004","rightsUri":"http://arxiv.org/licenses/assumed-1991-2003/"}],"descriptions":[{"description":"The diffusion of Ga and N adatoms has been studied for the technologically relevant wurtzite (000bar1) and (0001) surfaces employing density-functional theory. Our calculations reveal a very different diffusivity for Ga and N adatoms on the equilibrium surfaces: While Ga is very mobile at typical growth temperatures, the diffusion of N is by orders of magnitudes slower. These results give a very detailed insight of how and under which growth conditions N adatoms can be stabilized and efficiently incorporated at the surface. We further find that the presence of excess N strongly increases the Ga diffusion barrier and discuss the consequences for the growth of GaN.","descriptionType":"Abstract"},{"description":"4 pages, 4 figures, Appears in Appl. Phys. Lett. Other related publications can be found at 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